CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm,2sp - FmCeO2onYSZa101005S2FT40nm

CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm,2sp - FmCeO2onYSZa101005S2FT40nmSpecifications Epitaxial thin Film Composition <100> CeO2 Epitaxial Film Thickness 40 nm + 10 nm Growth method Spin coating Epitaxial FWHM < 5 o Substrate <100>, YSZ, 10x10x0. 5 mm, two side polished Package Sealed in Vacuum in a plastic box and bag Typical XRD and Rocking curve (click thumb pic to enlarge )

which is a narrow gap layered semiconductor with a hexagonal structure

7Mpa is recommended)

One pair of spare carbon brush is included for a replacement if the high-speed motor stop working

Electrosynthesis Reactor A-series/septa is an undivided batch cell that contains a solution of the substrates and reagents and it is operating for the time needed to complete the desired reaction until all the starting material is consumed

roughness:  as  Cold Rolling

a)  remove the backing and stick the microcloth pad to glass plate

25 units high

Minor Flat:               EJ(0-11)

Specifications: ID: 19 mm

Melting point: 1339 degree C

Split Test Cell

Single crystal SrTiO3